Design and Performance Comparison of 6-T SRAM Cell in 32nm CMOS, FinFET and CNTFET Technologies
نویسندگان
چکیده
منابع مشابه
Design and Analysis of 5-T SRAM Cell in 32nm CMOS and CNTFET Technologies
MOS transistor play a vital role in today VLSI technology. In CMOS based design, symmetry should be followed in circuit operation. Most of the complex circuits are allowed to design in CMOS, however, there are several drawbacks present in this complementary based design. CMOS has lost its credentiality during scaling beyond 32nm. Scaling down causes severe short channel effects which are diffic...
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In the world of Integrated Circuits, Complementary Metal–Oxide– Semiconductor (CMOS) has lost its credentiality during scaling beyond 32nm. Scaling causes severe Short Channel Effects (SCE) which are difficult to suppress. As a result of such SCE many alternate devices have been studied. Some of the major contestants include Multi Gate Field Effect Transistor (MuGFET) like FinFET and Carbon Nan...
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The SRAM which functions as the cache for system-on-chip is vital in the electronic industry. Carbon Nanotube Field Effect Transistor (CNFET) is used for high performance, high stability and low-power circuit designs as an alternative material to silicon in recent years. Therefore Design of SRAM Cell based on CNTFET is important for Low-power cache memory. In cells, the bit-lines are the most p...
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This paper proposes new methods for SRAM cell design in FinFET technology. One of the most important features of FinFET is that the independent front and back gates can be biased differently to control the current and the device threshold voltage. By controlling the back gate voltage of a FinFET, a SRAM cell can be designed for low power consumption. This paper proposes a new 8T (8 transistors)...
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As silicon semiconductor device feature size scales down to the nanometer range, planar bulk CMOS design and fabrication encounter significant challenges nowadays. Carbon Nanotube Field Effect Transistor (CNTFET) has been introduced for high stability, high performance and low power SRAM cell design as an alternative material. Technology scaling demands a decrease in both VDD and VT to sustain ...
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ژورنال
عنوان ژورنال: International Journal of Computer Applications
سال: 2013
ISSN: 0975-8887
DOI: 10.5120/12188-7751